Journal of Vacuum Science and Technology B
The design of the optical elements for a focused ion beam (FIB) system having a 50 mm spot size over a 1 mm square field requires extensive computational analysis. We discuss the mathematical techniques applied to the components of interest in this submicron FIB system; the electrostatic lenses, the mass analyzer, and the electrostatic deflectors. The results of ion trajectory calculations predicted for the whole FIB column by the computer code snow are presented. The aberration coefficients to third order and a parametric study of a stigmatic Wien filter whose design includes entrance and exit fringe field effects will be considered. We also cover our optimization algorithms for selecting lens and deflector elements which demonstrate minimal chromatic and spherical aberrations and distortions. A spot symmetry and spot location map for the final 1 mm square field and its 50 nm image constraint is shown for mixed electronic configurations of dynamic focus, dynamic distortion, and dynamic stigmation correctors. A comparison of the computer predictions to measured values of lens parameters is given for a typical liquid metal source and its extractor lens. The equipotentials in the vicinity of a representative lens is plotted with emphasis on the dielectric‐conductor interface in order to demonstrate the significance of stressed electric fields to the hardware designer.
Focused ion beams
Citation: Pilot Scholars Version (Modified MLA Style)
Thompson, W.; Honjo, I.; and Utlaut, Mark, "Computer simulations of submicron FIB system optics" (1984). Physics Faculty Publications and Presentations. Paper 40.