Journal Title

Journal of Vacuum Science and Technology B

Publication Date

11-1996

Abstract

This article investigates the limitations on the formation of focused ion beam images from secondary electrons. We use the notion of the information content of an image to account for the effects of resolution, contrast, and signal‐to‐noise ratio and show that there is a competition between the rate at which small features are sputtered away by the primary beam and the rate of collection of secondary electrons. We find that for small features, sputtering is the limit to imaging resolution, and that for extended small features (e.g., layered structures), rearrangement, redeposition, and differential sputtering rates may limit the resolution in some cases.

Subjects

Focused ion beams

Publication Information

Copyright 1996 American Vacuum Society. The original published version of this article may be found at http://dx.doi.org/10.1116/1.588663.

DOI

10.1116/1.588663

Peer-Reviewed

Yes

Document Type

Journal Article

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