Journal of Vacuum Science & Technology B
This article describes a Ga+ focused ion beam secondary ion mass spectroscopy system, and measures several quantities of interest to aid in interpreting secondary ion mass spectroscopy results. We have measured sputter yields and rates, estimated the instrument efficiency, and calculated useful yields and practical sensitivities for a variety of elements used in the semiconductor industry. We have performed measurements at the system base pressure, and have also introduced oxygen and iodine to determine any enhancement effects.
Focused ion beams; Secondary ion mass spectrometry
Citation: Pilot Scholars Version (Modified MLA Style)
Crow, G. A.; Christman, Locke; and Utlaut, Mark, "A focused ion beam secondary ion mass spectrometry system" (1995). Physics Faculty Publications and Presentations. Paper 33.