Journal Title

Journal of Vacuum Science & Technology B

Publication Date

11-1995

Abstract

This article describes a Ga+ focused ion beam secondary ion mass spectroscopy system, and measures several quantities of interest to aid in interpreting secondary ion mass spectroscopy results. We have measured sputter yields and rates, estimated the instrument efficiency, and calculated useful yields and practical sensitivities for a variety of elements used in the semiconductor industry. We have performed measurements at the system base pressure, and have also introduced oxygen and iodine to determine any enhancement effects.

Subjects

Focused ion beams; Secondary ion mass spectrometry

Publication Information

Copyright 1995 American Vacuum Society. The original published version of this article may be found at http://dx.doi.org/10.1116/1.588034.

DOI

10.1116/1.588034

Peer-Reviewed

Yes

Document Type

Journal Article

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